Kompetenzzentrum für in-line Nanostrukturanalytik

TU Wien intends to significantly expand its infrastructure for the production and characterisation of micro- and nanostructures in order to further enhance its international competitiveness in the fields of nanotechnology, opto- and quantum electronics and sensor technology. To this end, a competence centre for in-line nanostructure analysis is to be established and operated within the existing central clean room facility at TU Wien, the Centre for Micro- and Nanostructures (ZMNS). The production and characterisation of ultra-thin semiconductor layer systems (supperlattices) are to be closely interlinked in order to obtain fast and precise feedback on the physical properties of the layer systems. At the heart of the competence centre are two highly specialised devices for semiconductor micro- and nanofabrication and the characterisation of semiconductors: a laser lithography system for mask-free structuring and a high-resolution X-ray diffractometer (HRXRD). The laser lithography system is to be used for the flexible, fast and comparatively easy-to-use structuring of substrates with a resolution of less than 600 nanometres (nm). The device thus closes the gap between the electron beam lithography system newly installed at ZMNS in May 2024 and conventional contact photolithography. In contrast to other X-ray diffractometers available in the Viennese research landscape, the HRXRD is intended to be a device specialised for semiconductor samples that provides direct and high-precision feedback on the crystal structure and quality of complex materials ‘in-line’, i.e. during the manufacturing process. New material compositions are to be developed in a targeted manner through the installation of these devices and the co-operation of both and through the coordinated structure in the ZMNS clean room processes and material topics of the Viennese research landscape.